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Exploration of the Limits to Mobility in Two-Dimensional Hole Systems in GaAs/AlGaAs Quantum Wells

机译:中国二维孔系统运动极限的探讨   Gaas / alGaas量子阱

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摘要

We report on the growth and electrical characterization of a series oftwo-dimensional hole systems (2DHSs) used to study the density dependence oflow temperature mobility in 20 nm GaAs/AlGaAs quantum wells. The hole densitywas controlled by changing the Al mole fraction and the setback of thedelta-doping layer. We varied the density over a range from 1.8 $\times$10$^{10}$ cm$^{-2}$ to 1.9 $\times$ 10$^{11}$ cm$^{-2}$ finding a nonmonotonicdependence of mobility on density at T = 0.3 K. Surprisingly, a peak mobilityof 2.3 $\times$ 10$^6$ cm$^2$/Vs was measured at a density of 6.5 $\times$10$^{10}$ cm$^{-2}$ with further increase in density resulting in reducedmobility. We discuss possible mechanisms leading to the observed non-monotonicdensity dependence of the mobility. Relying solely on interface roughnessscattering to explain the observed drop in mobility at high density requiresroughness parameters which are not consistent with measurements of similarelectron structures. This leaves open the possibility of contributions fromother scattering mechanisms at high density.
机译:我们报告了用于研究20 nm GaAs / AlGaAs量子阱中低温迁移率的密度依赖性的一系列二维空穴系统(2DHS)的生长和电学特性。通过改变Al摩尔分数和δ掺杂层的缩进来控制空穴密度。我们将密度从1.8 $ \ times $ 10 $ ^ {10} $ cm $ ^ {-2} $更改为1.9 $ \ times $ 10 $ ^ {11} $ cm $ ^ {-2} $ T = 0.3 K时,迁移率对密度的非单调依赖性。令人惊讶的是,在6.5 $ \ times $ 10 $ ^ {10} $的密度下,测得的峰迁移率为2.3 $×10 $ ^ 6 $ cm $ ^ 2 $ / Vs。 cm $ ^ {-2} $,密度进一步提高,导致迁移率降低。我们讨论了导致流动性的非单调密度依赖性的可能机制。仅依靠界面粗糙度散射来解释在高密度下观察到的迁移率下降需要的粗糙度参数与相似电子结构的测量值不一致。这就留下了其他高密度散射机制做出贡献的可能性。

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